SPIK®1000A
SPIK®2000A
|
|
For plasma cleaning, plasma activating, plasma
etching, PVD- bias, reactive sputtering by single and dual magnetrons
configurations, plasma- CVD, plasma diffusion, and plasma nitriding
applications |
|
Highest plasma density |
|
Independent free-adjustable ON and OFF
Time Control Factors
|
|
Quick arc detection and elimination in less than 2 µs |
| Easy to
retrofit into your existing dc plasma application |
|
Pulse
trains by using external Arbitrary Waveform Generator |
|
Fast DSP control
technology, LCD control panel, RS 232 port
|
|
Versatile operation modes dc+, dc-, unipolar+, unipolar-,
bipolar: |
Asymmetric Bipolar Output Symmetric Bipolar Output
Two DC power supplies are necessary, Vdc+
≠Vdc-
|
