Hybrid PECVD/PEALD
Hybrid PECVD/PEALD System
Hybrid PECVD/PEALD Systems
The NANO-MASTER NLP-4000 is a stand-alone hybrid PECVD/PEALD system for performing plasma-enhanced atomic layer deposition (PEALD) as well as plasma-enhanced chemical vapor deposition (PECVD). Both processes can be performed in a single chamber without any mechanical reconfiguration. It is also capable of depositing a stack of layers of PEALD/PECVD in the same process. It is CE and SEMI Standards-compliant and capable of processing up to 8” wafers. The system is controlled with LabVIEW software and features three-level password-controlled user authorization using a touch-screen monitor. The system is fully automated, safety-interlocked, recipe-driven, with status indicators and graphic and alphanumeric displays.
- 13" Ni-plated Al chamber w/ heated chamber wall
- 5x10-7 Torr base pressure attained with turbo pumping package
- ICP plasma source
- High surface ALD filter at the chamber exhaust
- Level precursor distribution
- Platen: Up to 400°C, biasable with RF, handles up to 8" wafers
- Load Lock: Automatic load and unload
- MFC's with electropolished gas lines and pneumatic shut-off valves
- Fully automated PC based, recipe driven
- LabVIEW user interface
- EMO protection and safety interlocks
- Provision for 150cc bubblers for Si or Ga for depositing PEVCD films.
- Seperate gas pod for reactive/toxic gasses with gas leak sensors
- Metallization and Gate Stack
- GaN G-HEMT Transistor
- Supercapacitor
- Power Electronics
- Gas Permeation Barrier
- Solar Cell Applications
