Single Wafer Cleaning
SWC-4000
Single Wafer Cleaning Systems
NANO-MASTERS’s Single Wafer Cleaners (SWC) focus on providing the best possible cleaning capability while maintaining affordability. A standard system is configured with clean, chemical clean, brush clean, high RPM spin dry with IR heating and N2 flow. Patented megasonic nozzle movement assures uniform delivery of megasonic energy; therefore, at any point on the surface, energy delivered can be kept below damage threshold.
- 12" OD, 7" x 7" substrates
- Table top unit
- Venturi powered vacuum
- Damage free megasonic
- Independent chemical dispenses
- Spin dry with heated N2
- Microprocessor controlled
- Chemical dispense unit
- Safety interlocks
- 19”x26” footprint
- PVA brush cleaning (100 RPM)
- Post CMP brush cleaning (up to 400 RPM)
- Nitrogen ionizer
- CO2 inject with DIW resistivity monitor
- FM4910 Materials
- Four 3.8L HDPE canisters
- Stand alone unit
- Dual drain for acids and solvents
- Suck back valves to prevent drips
- Back side DIW clean and dry
- In-line heaters for DIW or chemicals
- Fill sensors for chemical or DIW leaks
- Patterned and unpatterned masks and wafers
- Ge, GaAs and InP wafer cleaning
- Post CMP wafer cleaning
- Cleaning of diced chips on wafer frame
- Cleaning after plasma etch or photoresist stripping
- Mask blanks or contact mask cleaning
- Cleaning of X-ray and EUV masks
- Optical lens cleaning
- Cleaning of ITO coated display panels
- Megasonic assisted lift-off process
