Plasma Sources
NANO-MASTER Four Antenna Planar ICP Source
NANO-MASTER Shower Head Plasma Source SH-1000
- RF Shower Head Source
- Gases through RF Plate
- Secondary Plate to introduce other gasses to plasma
- Water Cooled
- Up to 600 W
- 0.02 Torr to 8 Torr operation
- 8" active area
- ISO 250 Flange
Hollow Cathode 13.56 MHz RF Plasma Sources
- Operation over an extended power and pressure range.
- High plasma and radical species densities with excellent homogenity (1011 cm-3).
- Compatible with chemical reactive and non-reactive gases
- Cw and pulsed power operation
- Low contamination
- Linear type also available in 600 mm and 900 mm
- Plasma enhanced chemical vapor deposition (PECVD)
- Plasma polymerization, plasma cleaning, plasma etching
- Surface modification
SLAN (SLot ANtenna) 2.45 GHz Microwave Plasma Sources
- High plasma densities
- Pressure range from 10-5 mbar up to atmospheric pressure
- Compatible with chemically reactive and non-reactive gases
- Low contamination
- ECR and non-ECR operation
- Cw and pulsed operation
- Available in 4, 16 and 67 cm diameters
- Plasma enhanced chemical vapor deposition (PECVD)
- Plasma polymerization, plasma cleaning, plasma etching
- Surface modification
- Material science
Inductively Coupled Plasma Source ICP-P 200 (13.56 MHz)
- Planar coil with 200 mm diameter
- Extended power range (3-1200 W)
- Low ion energy with narrow energy spread
- High plasma and radical densities
- Low contamination
- Cw and pulsed operation
- Plasma enhanced chemical vapor deposition (PECVD)
- Plasma polymerization, plasma cleaning, plasma etching
- Surface modification
- MaterialS science