Roll-to-Roll Atomic Layer Deposition

NLD-4000

Roll-to-Roll Atomic Layer Deposition

The roll-to-roll (R2R) plasma-enhanced atomic layer deposition (PEALD) system is designed for the continous processing of flexible substrates and inline multilayer ALD coating on glass panels. The system addresses the need for high-throughput, uniform, and conformal thin film dpeosition on flexible materials, which is critical for applications such as flexible electronics, displays, barrier coatings, and panels. NANO-MASTER's patented continuous flow process doubles the throughput of traditional ALD systems.

A few key advantages of roll-to-roll PEALD are:

Continous processing: The R2R configuration allows for uninterrupted deposition, which significantly increases throughput compared to batch processess.

Uniform thin films: The combination of PEALD with R2R ensures highly uniform and conformal coatings, even on substrates with complex topographies.

Scalability: The system is designed to be scalable for industrial applications, facilitating the mass production of components.

Reduced thermal need: PEALD enables thim film deposition at lower temperatures, mkaing it suitable for temperature-sensitive flexible substrates.

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